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ISQED
2005
IEEE
84views Hardware» more  ISQED 2005»
16 years 26 days ago
Performance Driven OPC for Mask Cost Reduction
With continued aggressive process scaling in the subwavelength lithographic regime, resolution enhancement techniques (RETs) such as optical proximity correction (OPC) are an inte...
Puneet Gupta, Andrew B. Kahng, Dennis Sylvester, J...