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ISPD
1998
ACM
15 years 10 months ago
1998
ACM
In very deep-submicron VLSI, certain manufacturing steps – notably optical exposure, resist development and etch, chemical vapor deposition and chemical-mechanical polishing (CM...
147
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ICCAD
1998
IEEE
15 years 10 months ago
1998
IEEE
It is known to many researchers in the partitioning community that the recursive bipartitioning approach outperforms the direct non-recursive approach in solving the multiway part...