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177
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ISQED
2007
IEEE
16 years 23 days ago
2007
IEEE
— In the past, dynamic voltage and frequency scaling (DVFS) has been widely used for power and energy optimization in embedded system design. As thermal issues become increasingl...
142
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ISQED
2007
IEEE
16 years 23 days ago
2007
IEEE
Errors caused by tolerance variations and mismatches among components severely degrade the performance of integrated circuits. These random effects in process parameters significa...
131
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ISQED
2007
IEEE
16 years 23 days ago
2007
IEEE
For emerging deep-subwavelength lithography technologies (90 nm and following) the data volume and the complexity of Optical Proximity Correction (OPC) have increased dramatically...
148
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ISVLSI
2007
IEEE
16 years 23 days ago
2007
IEEE
Designing high-performance low-power register files is of critical importance to the continuation of current performance advances in wide-issue and deeply-pipelined superscalar m...
160
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ISVLSI
2007
IEEE
16 years 23 days ago
2007
IEEE
— Chemical-Mechanical Polishing (CMP) is one of the key steps during nanometer VLSI manufacturing process where minimum variation of layout pattern densities is desired. This pap...