2519 search results - page 334 / 504 » cost 2007 |
173
click to vote
ICCAD
2007
IEEE
16 years 3 months ago
2007
IEEE
—As the 193nm lithography is likely to be used for 45nm and even 32nm processes, much more stringent requirement will be posed on Optical Proximity Correction (OPC) technologies....
173
click to vote
ICCAD
2007
IEEE
16 years 3 months ago
2007
IEEE
While the increasing need for addressing process variability in sub-90nm VLSI technologies has sparkled a large body of statistical timing and optimization research, the realizati...
164
click to vote
ICCAD
2007
IEEE
16 years 3 months ago
2007
IEEE
— Determination of maximum operating frequencies (Fmax) during manufacturing test at different operating voltages is required to: (a) to ensure that, for a Dynamic Voltage and Fr...
185
click to vote
SOSP
2007
ACM
16 years 3 months ago
2007
ACM
We present Zyzzyva, a protocol that uses speculation to reduce the cost and simplify the design of Byzantine fault tolerant state machine replication. In Zyzzyva, replicas respond...
164
click to vote
3DIM
2007
IEEE
16 years 27 days ago
2007
IEEE
This paper describes a method for constructing feature landmark database using omnidirectional videos and GPS positions acquired in outdoor environments. The feature landmark data...