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DAC
2009
ACM
16 years 7 months ago
Double patterning lithography friendly detailed routing with redundant via consideration
In double patterning lithography (DPL), coloring conflict and stitch minimization are the two main challenges. Post layout decomposition algorithm [1] [2]may not be enough to achi...
Kun Yuan, Katrina Lu, David Z. Pan
163
Voted
SIGSOFT
2009
ACM
16 years 7 months ago
Fair and balanced?: bias in bug-fix datasets
Software engineering researchers have long been interested in where and why bugs occur in code, and in predicting where they might turn up next. Historical bug-occurence data has ...
Christian Bird, Adrian Bachmann, Eirik Aune, John ...
ICDT
2009
ACM
175views Database» more  ICDT 2009»
16 years 7 months ago
Structural characterizations of schema-mapping languages
Schema mappings are declarative specifications that describe the relationship between two database schemas. In recent years, there has been an extensive study of schema mappings a...
Balder ten Cate, Phokion G. Kolaitis
ICDT
2009
ACM
150views Database» more  ICDT 2009»
16 years 7 months ago
Optimizing user views for workflows
A technique called user views has recently been proposed to focus user attention on relevant information in response to provenance queries over workflow executions [1, 2]: Given u...
Olivier Biton, Susan B. Davidson, Sanjeev Khanna, ...
153
Voted
WWW
2009
ACM
16 years 7 months ago
Blog credibility ranking by exploiting verified content
People use weblogs to express thoughts, present ideas and share knowledge. However, weblogs can also be misused to influence and manipulate the readers. Therefore the credibility ...
Andreas Juffinger, Michael Granitzer, Elisabeth Le...
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