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» Unsupervised Feature Selection Using Feature Similarity
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ICIP
2010
IEEE
15 years 4 months ago
Stochastic gradient descent for robust inverse photomask synthesis in optical lithography
Optical lithography is a critical step in the semiconductor manufacturing process, and one key problem is the design of the photomask for a particular circuit pattern, given the o...
Ningning Jia, Edmund Y. Lam
CVPR
2011
IEEE
15 years 2 months ago
Branch and Track
We present a new paradigm for tracking objects in video in the presence of other similar objects. This branch-andtrack paradigm is also useful in the absence of motion, for the di...
Steve Gu, Carlo Tomasi
FGR
2011
IEEE
271views Biometrics» more  FGR 2011»
14 years 10 months ago
Active conditional models
— Matching images with large geometric and iconic changes (e.g. faces under different poses and facial expressions) is an open research problem in computer vision. There are two ...
Ying Chen, Fernando De la Torre
CSDA
2007
137views more  CSDA 2007»
15 years 6 months ago
Fitting finite mixtures of generalized linear regressions in R
R package flexmix provides flexible modelling of finite mixtures of regression models using the EM algorithm. Several new features of the software such as fixed and nested var...
Bettina Grün, Friedrich Leisch
162
Voted
ICIP
2005
IEEE
16 years 8 months ago
Tracking points on deformable objects with ranklets
We present a robust algorithm for point tracking on deformable objects. The key elements are the use of orientation selective rank features (ranklets), local filter adaptation and...
Fabrizio Smeraldi, Alessio Del Bue, Lourdes de Aga...