6111 search results - page 801 / 1223 » Time, Hardware, and Uniformity |
207
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ISPD
2010
ACM
16 years 1 months ago
2010
ACM
Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
174
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TEI
2010
ACM
16 years 1 months ago
2010
ACM
Since commercial musical recordings became available about a century ago and until very recently, they had always been distributed by means of a physical support. Nowadays that re...
147
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ATS
2009
IEEE
16 years 1 months ago
2009
IEEE
Diagnostic ATPG has traditionally been used to generate test patterns that distinguish pairs of modeled faults. In this work, we investigate the use of n-distinguishing test sets,...
168
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ISQED
2009
IEEE
16 years 1 months ago
2009
IEEE
—As device feature size continues to shrink, reliability becomes a severe issue due to process variation, particle-induced transient errors, and transistor wear-out/stress such a...
182
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ISPD
2009
ACM
16 years 1 months ago
2009
ACM
Glitches (spurious transitions) are common in electronic circuits. In this paper we present a novel approach to reduce dynamic power in FPGAs by reducing glitches during the routi...