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DAC
2006
ACM
16 years 7 months ago
Process variation aware OPC with variational lithography modeling
Optical proximity correction (OPC) is one of the most widely used resolution enhancement techniques (RET) in nanometer designs to improve subwavelength printability. Conventional ...
Peng Yu, Sean X. Shi, David Z. Pan
MICCAI
2003
Springer
16 years 7 months ago
An Automatic System for Classification of Nuclear Sclerosis from Slit-Lamp Photographs
A robust and automatic system has been developed to detect the visual axis and extract important feature landmarks from slit-lamp photographs, and objectively grade the severity of...
Shaohua Fan, Charles R. Dyer, Larry Hubbard, Barba...
MICCAI
2005
Springer
16 years 7 months ago
Accurate Image Registration for Quadrature Tomographic Microscopy
Abstract. This paper presents a robust and fully automated registration algorithm for registration of images of Quadrature Tomographic Microscopy (QTM), which is an optical interfe...
Chia-Ling Tsai, William Warger, Charles DiMarzio
ICML
2004
IEEE
16 years 7 months ago
Approximate inference by Markov chains on union spaces
A standard method for approximating averages in probabilistic models is to construct a Markov chain in the product space of the random variables with the desired equilibrium distr...
Max Welling, Michal Rosen-Zvi, Yee Whye Teh
ICML
2003
IEEE
16 years 7 months ago
Goal-directed Learning to Fly
Learning to fly an aircraft is a complex task that requires the development of control skills and goal achievement strategies. This paper presents a behavioural cloning system tha...
Andrew Isaac, Claude Sammut