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150
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ISQED
2010
IEEE
16 years 1 months ago
2010
IEEE
—Double patterning lithography (DPL) provides an attractive alternative or a supplementary method to enable the 32nm and 22nm process nodes, relative to costlier technology optio...
165
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ASPLOS
2010
ACM
16 years 1 months ago
2010
ACM
Contention for shared resources on multicore processors remains an unsolved problem in existing systems despite significant research efforts dedicated to this problem in the past...
182
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ASPLOS
2010
ACM
16 years 1 months ago
2010
ACM
The Local Outlier Factor (LOF) is a very powerful anomaly detection method available in machine learning and classification. The algorithm defines the notion of local outlier in...
179
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ACSAC
2009
IEEE
16 years 1 months ago
2009
IEEE
: © An Empirical Approach to Modeling Uncertainty in Intrusion Analysis Xinming Ou, Siva Raj Rajagopalan, Sakthiyuvaraja Sakthivelmurugan HP Laboratories HPL-2009-334 intrusion de...
183
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WSDM
2009
ACM
16 years 1 months ago
2009
ACM
We introduce a new visual search interface for search engines. The interface is a user-friendly and informative graphical front-end for organizing and presenting search results in...