As Double Patterning Lithography(DPL) becomes the leading candidate for sub-30nm lithography process, we need a fast and lithography friendly decomposition framework. In this pape...
Jae-Seok Yang, Katrina Lu, Minsik Cho, Kun Yuan, D...
Due to the complex nature of scientific workflow environments, temporal violations often take place and may severely reduce the timeliness of the execution’s results. To handle ...
We present an approximation scheme for optimizing certain Quadratic Integer Programming problems with positive semidefinite objective functions and global linear constraints. Thi...
Facial caricatures exaggerate key features to emphasize unique structural and personality traits. It is quite a challenge to retain the identity of the original person despite the ...
— In this work, we present novel warping algorithms for full 2D pixel-grid deformations for face recognition. Due to high variation in face appearance, face recognition is consid...
Tobias Gass, Leonid Pishchulin, Philippe Dreuw, He...