We introduce a new EM framework in which it is possible not only to optimize the model parameters but also the number of model components. A key feature of our approach is that we...
—As the 193nm lithography is likely to be used for 45nm and even 32nm processes, much more stringent requirement will be posed on Optical Proximity Correction (OPC) technologies....
This paper presents an in-depth study of the theory and algorithms for the SPFD-based (Set of Pairs of Functions to be Distinguished) rewiring, and explores the flexibility in the...
We propose a new paradigm for building scalable distributed systems. Our approach does not require dealing with message-passing protocols—a major complication in existing distri...
Marcos Kawazoe Aguilera, Arif Merchant, Mehul A. S...
In this paper, we present the design of a new fMRI compatible haptic interface with 3DOFs, based on electrical DC actuation, for the study of brain mechanisms of human motor contr...
Siqiao Li, Antonio Frisoli, Luigi Federico Borelli...