Phase shifting mask (PSM) is a promising resolution enhancement technique, which is used in the deep sub-wavelength lithography of the VLSI fabrication process. However, applying ...
Abstract. We consider workflow graphs as a model for the control flow of a business process model and study the problem of workflow graph parsing, i.e., finding the structure of a ...
This paper investigates the application of causal inference methodology for observational studies to software fault localization based on test outcomes and profiles. This methodo...
- By putting different chips on the same mask, shuttle mask (or multiple project wafer) provides an economical solution for low volume designs and design prototypes to share the ri...
Gang Xu, Ruiqi Tian, David Z. Pan, Martin D. F. Wo...
Reversibility is of interest in achieving extremely low power dissipation; it is also an inherent design requirement of quantum computation. Logical fault models for conventional ...
Ilia Polian, Thomas Fiehn, Bernd Becker, John P. H...