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162
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ICCAD
2007
IEEE
16 years 4 months ago
2007
IEEE
— As nanometer technology advances, the post-CMP dielectric thickness variation control becomes crucial for manufacturing closure. To improve CMP quality, dummy feature filling ...
185
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ICCAD
2007
IEEE
16 years 4 months ago
2007
IEEE
— Determination of maximum operating frequencies (Fmax) during manufacturing test at different operating voltages is required to: (a) to ensure that, for a Dynamic Voltage and Fr...
154
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ICCAD
2006
IEEE
16 years 4 months ago
2006
IEEE
This paper examines how circuits and systems made from molecular QCA devices might function. Our design constraints are “chemically reasonable” in that we consider the charact...
165
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HICSS
2009
IEEE
16 years 2 months ago
2009
IEEE
Customers of complex IT-services increasingly demand integrated value bundles that fit their individual needs. At the same time, IT service providers are facing commoditization of...
184
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IPPS
2009
IEEE
16 years 1 months ago
2009
IEEE
With the increasing trend of microprocessor manufacturers to rely on parallelism to increase their products’ performance, there is an associated increasing need for simple techn...