12032 search results - page 362 / 2407 » Simulation of Manufacturing Systems |
171
click to vote
SLIP
2009
ACM
16 years 1 months ago
2009
ACM
Double patterning lithography seems to be a prominent choice for 32nm and 22nm technologies. Double patterning lithography techniques require additional masks for a single interco...
168
click to vote
DATE
2008
IEEE
16 years 1 months ago
2008
IEEE
With the increasing levels of variability and randomness in the characteristics and behavior of manufactured nanoscale structures and devices, achieving performance optimization u...
166
click to vote
ICC
2008
IEEE
16 years 1 months ago
2008
IEEE
Abstract—Although predicting the RFID tag distribution before a read cycle begins would be generally difficult and even futile, a likely and interesting scenario is where the ta...
195
click to vote
ISQED
2008
IEEE
16 years 1 months ago
2008
IEEE
The effects of random variations during the manufacturing process on devices can be simulated as a variation of transistor parameters. Device degradation, due to temperature or vo...
177
click to vote
VTC
2008
IEEE
16 years 1 months ago
2008
IEEE
—Orthogonal frequency division multiplexing (OFDM) is currently under intense research for broadband wireless transmission due to its robustness against multipath fading. However...