Post-silicon validation has recently drawn designers' attention due to its increasing impacts on the VLSI design cycle and cost. One key feature of the post-silicon validatio...
Recently, a number of watermarking-based intellectual property protection techniques have been proposed. Although they have been applied to different stages in the design process ...
The many levels of metal used in aggressive deep submicron process technologies has made fast and accurate capacitance extraction of complicated 3-D geometries of conductors essen...
In this paper, we propose a technique to implement communication protocols as hardware circuits using a model of concurrent EFSMs with multi-way synchronization. Since use of mult...
Recent successes in the development and self-assembly of nanoelectronic devices suggest that the ability to manufacture dense nanofabrics is on the near horizon. However, the trem...
Margarida F. Jacome, Chen He, Gustavo de Veciana, ...