2234 search results - page 279 / 447 » Protocol Implementation Using Integrated Layer Processing |
266
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VLSISP
2011
15 years 1 months ago
2011
Machine-learning algorithms are employed in a wide variety of applications to extract useful information from data sets, and many are known to suffer from superlinear increases in ...
151
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ISQED
2010
IEEE
16 years 1 months ago
2010
IEEE
—Double patterning lithography (DPL) provides an attractive alternative or a supplementary method to enable the 32nm and 22nm process nodes, relative to costlier technology optio...
186
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ISPD
2010
ACM
16 years 1 months ago
2010
ACM
Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
199
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SIGGRAPH
1995
ACM
15 years 10 months ago
1995
ACM
This paper presents a hybrid model for animation of soft inelastic substance which undergo topological changes, e.g. separation and fusion and which fit with the objects they are...
142
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CASCON
2003
15 years 7 months ago
2003
Many software engineering research tools are stand-alone applications that have trouble interoperating with other development tools and do not fit well into the software develope...