We derive bounds on the expected loss for authentication protocols in channels which are constrained due to noisy
conditions and communication costs. This is motivated by a
numbe...
Double patterning lithography (DPL) is a likely resolution enhancement technique for IC production in 32nm and below technology nodes. However, DPL gives rise to two independent, ...
We present novel wavelet-based inpainting algorithms. Applying ideas from anisotropic regularization and diffusion our models can better handle degraded pixels at edges. We interp...
In this paper, we focus on methodology of finding a classifier with a minimal cost in presence of additional performance constraints. ROCCH analysis, where accuracy and cost are i...
This paper focuses on statistical interconnect timing analysis in a parameterized block-based statistical static timing analysis tool. In particular, a new framework for performin...