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    » On Ubiquitous Integrated Computing
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    A novel synthesis approach for active leakage power reduction using dynamic supply gating
    16 years 8 months ago
    A novel synthesis approach for active leakage power reduction using dynamic supply gating
    Download  www.inf.ethz.ch
    : Due to exponential increase in subthreshold leakage with technology scaling and temperature increase, leakage power is becoming a major fraction of total power in the active mode...
    Swarup Bhunia, Nilanjan Banerjee, Qikai Chen, Hami...
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    Segregation by primary phase factors: a full-wave algorithm for model order reduction
    16 years 8 months ago
    Segregation by primary phase factors: a full-wave algorithm for model order reduction
    Download  www.rle.mit.edu
    Existing Full-wave Model Order Reduction (FMOR) approaches are based on Expanded Taylor Series Approximations (ETAS) of the oscillatory full-wave system matrix. The accuracy of su...
    Thomas J. Klemas, Luca Daniel, Jacob K. White
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    Temperature-aware resource allocation and binding in high-level synthesis
    16 years 8 months ago
    Temperature-aware resource allocation and binding in high-level synthesis
    Download  www.ece.northwestern.edu
    Physical phenomena such as temperature have an increasingly important role in performance and reliability of modern process technologies. This trend will only strengthen with futu...
    Rajarshi Mukherjee, Seda Ogrenci Memik, Gokhan Mem...
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    Correlation-preserved non-gaussian statistical timing analysis with quadratic timing model
    16 years 8 months ago
    Correlation-preserved non-gaussian statistical timing analysis with quadratic timing model
    Download  vlsi.ece.wisc.edu
    Recent study shows that the existing first order canonical timing model is not sufficient to represent the dependency of the gate delay on the variation sources when processing an...
    Lizheng Zhang, Weijen Chen, Yuhen Hu, John A. Gubn...
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    Process variation aware OPC with variational lithography modeling
    16 years 8 months ago
    Process variation aware OPC with variational lithography modeling
    Download  www.cerc.utexas.edu
    Optical proximity correction (OPC) is one of the most widely used resolution enhancement techniques (RET) in nanometer designs to improve subwavelength printability. Conventional ...
    Peng Yu, Sean X. Shi, David Z. Pan
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