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156
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ICIP
2010
IEEE
15 years 4 months ago
2010
IEEE
Optical lithography is a critical step in the semiconductor manufacturing process, and one key problem is the design of the photomask for a particular circuit pattern, given the o...
186
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ICPR
2010
IEEE
15 years 4 months ago
2010
IEEE
In recent years, fractal and multi-fractal analysis have been widely applied in many domains, especially in the field of image processing. In this direction we present in this pape...
179
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ICPR
2010
IEEE
15 years 4 months ago
2010
IEEE
In this paper we redefine and generalize the classic k-nearest neighbors (k-NN) voting rule in a Bayesian maximum-a-posteriori (MAP) framework. Therefore, annotated examples are u...
172
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ICRA
2010
IEEE
15 years 4 months ago
2010
IEEE
We present an approach for efficiently recognizing all objects in a scene and estimating their full pose from multiple views. Our approach builds upon a state of the art single-vie...
178
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IMC
2010
ACM
15 years 4 months ago
2010
ACM
Previous methods of network anomaly detection have focused on defining a temporal model of what is "normal," and flagging the "abnormal" activity that does not...