The authors have developed a new approach to database interoperability using the sketch data model. That technique has now been used in a number of applications, but an important ...
—Double patterning lithography (DPL) provides an attractive alternative or a supplementary method to enable the 32nm and 22nm process nodes, relative to costlier technology optio...
Kwangok Jeong, Andrew B. Kahng, Rasit Onur Topalog...
General-purpose middleware, by definition, cannot readily support domain-specific semantics without significant manual efforts in specializing the middleware. This paper prese...
Sumant Tambe, Akshay Dabholkar, Aniruddha S. Gokha...
In this paper, we propose a novel technique for estimating focused image sequences captured by an out-of-focus camera. The basic concept used in the proposed algorithm employs mul...
Commercial SRAM-based FPGAs have the potential to provide aerospace applications with the necessary performance to meet next-generation mission requirements. However, the suscepti...