— As the cost of embedded sensors and actuators drops, new applications will arise that exploit high density networks of small devices capable of a variety of sensing tasks. Alth...
Lewis Girod, Vladimir Bychkovskiy, Jeremy Elson, D...
—As the 193nm lithography is likely to be used for 45nm and even 32nm processes, much more stringent requirement will be posed on Optical Proximity Correction (OPC) technologies....
This paper introduces a CAD framework for co-simulation of hybrid circuits containing CMOS and SET (Single Electron Transistor) devices. An improved analytical model for SET is al...
This paper presents an efficient method to reduce complexities of a linear network in s-domain. The new method works on circuit matrices directly and reduces the circuit complexi...
This paper presents the sizing rules method for analog CMOS circuit design that consists of: first, the development of a hierarchical library of transistor pair groups as basic b...
Helmut E. Graeb, Stephan Zizala, Josef Eckmueller,...