In this paper we present a new architecture for face recognition with a single reference image, which completely separates the training process from the recognition process. In th...
During maintenance, software is modified and evolved to enhance its functionality, eliminate faults, and adapt it to changed or new platforms. In this demo, we present BERT, a too...
High fidelity rendering via ray tracing requires tracing incoherent rays for global illumination and other secondary effects. Recent research show that the performance benefits fr...
Diverse forms of the concept of opposition are already existent in philosophy, linguistics, psychology and physics. The interplay between entities and opposite entities is apparent...
Double patterning lithography (DPL) is a likely resolution enhancement technique for IC production in 32nm and below technology nodes. However, DPL gives rise to two independent, ...