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179
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ICCAD
2007
IEEE
16 years 3 months ago
2007
IEEE
—As the 193nm lithography is likely to be used for 45nm and even 32nm processes, much more stringent requirement will be posed on Optical Proximity Correction (OPC) technologies....
187
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ICCAD
2002
IEEE
16 years 3 months ago
2002
IEEE
In mixed-signal designs, substrate noise originating from the digital part can seriously influence the functionality of the analog part. As such, accurately modeling the properti...
206
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CVPR
2010
IEEE
16 years 3 months ago
2010
IEEE
In this paper, we propose a novel supervised hierarchical sparse coding model based on local image descriptors for classification tasks. The supervised dictionary training is perf...
205
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CVPR
2010
IEEE
16 years 2 months ago
2010
IEEE
Multiple instance (MI) learning is a recent learning paradigm that is more flexible than standard supervised learning algorithms in the handling of label ambiguity. It has been u...
178
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TACAS
2010
Springer
16 years 1 months ago
2010
Springer
Boolean satisfiability (SAT) and its extensions are becoming a core technology for the analysis of systems. The SAT-based approach divides into three steps: encoding, preprocessin...