The Cross-Entropy (CE) method is a modern and effective optimization method well suited to parallel implementations. There is a vast array of problems today, some of which are hig...
Gareth E. Evans, Jonathan M. Keith, Dirk P. Kroese
To recognize three-dimensional objects it is important to
model how their appearances can change due to changes
in viewpoint. A key aspect of this involves understanding
which o...
Ronen Basri, Pedro F. Felzenszwalb, Ross B. Girshi...
Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
: We propose a novel algorithm to register multiple 3D point sets within a common reference frame simultaneously. Our approach performs an explicit optimisation on the manifold of ...
Shankar Krishnan, Pei Yean Lee, John B. Moore, Sur...
It has long been known that a fixed ordering of optimization phases will not produce the best code for every application. One approach for addressing this phase ordering problem ...
Prasad Kulkarni, Stephen Hines, Jason Hiser, David...