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TCAD
2010
194views more  TCAD 2010»
15 years 1 months ago
Layout Decomposition Approaches for Double Patterning Lithography
Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different ex...
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...
CVPR
2008
IEEE
16 years 8 months ago
Recognizing human actions using multiple features
In this paper, we propose a framework that fuses multiple features for improved action recognition in videos. The fusion of multiple features is important for recognizing actions ...
Jingen Liu, Saad Ali, Mubarak Shah
CVPR
1999
IEEE
16 years 8 months ago
On the Intrinsic Reconstruction of Shape from its Symmetries
The main question we address is: what is the minimal information required to generate closed, non-intersecting planar boundaries? For this paper we restrict ‘shape’ to this mea...
Peter J. Giblin, Benjamin B. Kimia
CVPR
2008
IEEE
16 years 8 months ago
3D occlusion recovery using few cameras
We present a practical framework for detecting and modeling 3D static occlusions for wide-baseline, multi-camera scenarios where the number of cameras is small. The framework cons...
Mark A. Keck, James W. Davis
ICDE
2009
IEEE
245views Database» more  ICDE 2009»
16 years 8 months ago
WISE: A Workflow Information Search Engine
Workflows are widely used for representing business processes, web services, scientific experiments, and activities in daily life, like recipes. There is an increasing need for peo...
Qihong Shao, Peng Sun, Yi Chen