6 search results - page 2 / 2 » Maximum Matchings in Planar Graphs via Gaussian Elimination |
178
click to vote
ISPD
2010
ACM
16 years 26 days ago
2010
ACM
Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...