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DAC
2000
ACM
15 years 11 months ago
Model-based dummy feature placement for oxide chemical-mechanical polishing manufacturability
—Chemical–mechanical polishing (CMP) is an enabling technique used in deep-submicrometer VLSI manufacturing to achieve long range oxide planarization. Post-CMP oxide topography...
Ruiqi Tian, D. F. Wong, Robert Boone
CHI
2004
ACM
16 years 7 months ago
WinCuts: manipulating arbitrary window regions for more effective use of screen space
Each window on our computer desktop provides a view into some information. Although users can currently manipulate multiple windows, we assert that being able to spatially arrange...
Desney S. Tan, Brian Meyers, Mary Czerwinski
CHI
2007
ACM
16 years 7 months ago
EyePoint: practical pointing and selection using gaze and keyboard
We present a practical technique for pointing and selection using a combination of eye gaze and keyboard triggers. EyePoint uses a two-step progressive refinement process fluidly ...
Manu Kumar, Andreas Paepcke, Terry Winograd
CHI
2008
ACM
16 years 7 months ago
Using tags to assist near-synchronous communication
In this work, we introduce the use of tags to support the near synchronous use of instant messaging (IM). As a proof-of-concept, we developed a plug-in in Lotus Sametime, an enter...
Gary Hsieh, Jennifer Lai, Scott E. Hudson, Robert ...
IEEEPACT
2008
IEEE
16 years 1 months ago
Characterizing and modeling the behavior of context switch misses
One of the essential features in modern computer systems is context switching, which allows multiple threads of execution to time-share a limited number of processors. While very ...
Fang Liu, Fei Guo, Yan Solihin, Seongbeom Kim, Abd...