Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
In this paper, we present a design methodology management system, which assists designers in selecting a suitable design process and invoking the selected sequence of tools on the...
Multimodal input is known to be advantageous for graphical user interfaces, but its benefits for non-visual interaction are unknown. To explore this issue, an exploratory study wa...
Visual information is processed in the posterior parietal cortex for the hypothesized purpose of extracting a variety of affordances for the generation of motor behavior. The term...
Multimodal interfaces are designed with a focus on flexibility, although very few currently are capable of adapting to major sources of user, task, or environmental variation. The...