2024 search results - page 186 / 405 » Improving quality, one process change at a time |
151
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ASPDAC
2007
ACM
15 years 10 months ago
2007
ACM
Abstract-- Due to photo-lithography effects and manufacture process variations, the actual features fabricated on the wafer are different from the designed ones. This difference ca...
123
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ISCAS
2006
IEEE
16 years 17 days ago
2006
IEEE
—This paper presents a high-performance CAVLC decoding VLSI architecture for MPEG-4 AVC/H.264. Instead of just skipping zero block, the proposed design explores the features of C...
175
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DAC
2005
ACM
16 years 7 months ago
2005
ACM
Achieving design closure is one of the biggest headaches for modern VLSI designers. This problem is exacerbated by high-level design automation tools that ignore increasingly impo...
147
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MVA
1994
15 years 7 months ago
1994
The OPC is one of the most important component in the electrophotography process. So far its surface defects which degrade print quality were inspected by human-eye. We have devel...
156
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RIAO
2000
15 years 7 months ago
2000
Given a set of categories, with or without a preexisting hierarchy among them, we consider the problem of assigning documents to one or more of these categories from the point of ...