We consider several approaches for reducing the complexity and power dissipation in processors that use separate register file to maintain the commited register values. The first ...
Gurhan Kucuk, Oguz Ergin, Dmitry Ponomarev, Kanad ...
Continued advancements in fabrication technology and reductions in feature size create challenges in maintaining both manufacturing yield rates and long-term reliability of device...
Premkishore Shivakumar, Stephen W. Keckler, Charle...
—As the 193nm lithography is likely to be used for 45nm and even 32nm processes, much more stringent requirement will be posed on Optical Proximity Correction (OPC) technologies....
In this paper we propose a novel analog design optimization methodology to address two key aspects of top-down system-level design: (1) how to optimally compare and select analog ...
Xin Li, Jian Wang, Lawrence T. Pileggi, Tun-Shih C...
This paper presents an efficient method to reduce complexities of a linear network in s-domain. The new method works on circuit matrices directly and reduces the circuit complexi...