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» From Requirements to Design: Formalizing the Key Steps
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ICIP
2010
IEEE
15 years 4 months ago
Stochastic gradient descent for robust inverse photomask synthesis in optical lithography
Optical lithography is a critical step in the semiconductor manufacturing process, and one key problem is the design of the photomask for a particular circuit pattern, given the o...
Ningning Jia, Edmund Y. Lam
SACRYPT
1998
Springer
257views Cryptology» more  SACRYPT 1998»
15 years 10 months ago
Cryptanalysis of RC4-like Ciphers
Abstract. RC4, a stream cipher designed by Rivest for RSA Data Security Inc., has found several commercial applications, but little public analysis has been done to date. In this p...
Serge Mister, Stafford E. Tavares
ACISP
2000
Springer
15 years 11 months ago
High Performance Agile Crypto Modules
This paper examines the impact of the primary symmetric key cryptographic operation on network data streams, encryption of user data, have on the overall tra c throughput. The encr...
Chandana Gamage, Jussipekka Leiwo, Yuliang Zheng
ISSTA
2009
ACM
16 years 1 months ago
An annotation assistant for interactive debugging of programs with common synchronization idioms
This paper explores an approach to improving the practical usability of static verification tools for debugging synchronization idioms. Synchronization idioms such as mutual excl...
Tayfun Elmas, Ali Sezgin, Serdar Tasiran, Shaz Qad...
DASIP
2010
15 years 1 months ago
RVC: A multi-decoder CAL Composer tool
The Reconfigurable Video Coding (RVC) framework is a recent ISO standard aiming at providing a unified specification of MPEG video technology in the form of a library of component...
Francesca Palumbo, Danilo Pani, Emanuele Manca, Lu...