Updates over virtual XML views that wrap relational data are not well supported by XML data management systems. This paper studies the problem of whether a correct relational upda...
Abstract--To reduce chip-scale topography variation in Chemical Mechanical Polishing (CMP) process, dummy fill is widely used to improve the layout density uniformity. Previous res...
Chunyang Feng, Hai Zhou, Changhao Yan, Jun Tao, Xu...
Recent successes in the development and self-assembly of nanoelectronic devices suggest that the ability to manufacture dense nanofabrics is on the near horizon. However, the trem...
Margarida F. Jacome, Chen He, Gustavo de Veciana, ...
Physical phenomena such as temperature have an increasingly important role in performance and reliability of modern process technologies. This trend will only strengthen with futu...
Rajarshi Mukherjee, Seda Ogrenci Memik, Gokhan Mem...
It is extremely hard for a global organization with services over multiple channels to capture a consistent and unified view of its data, services, and interactions. While SOA and...
Ismail Ari, Jun Li, Riddhiman Ghosh, Mohamed Dekhi...