Although usability methods are widely used for evaluating conventional graphical user interfaces and websites, there is a growing concern that current approaches are inadequate fo...
Parmit K. Chilana, Jacob O. Wobbrock, Andrew J. Ko
Privacy practices in social network sites often appear paradoxical, as content-sharing behavior stands in conflict with the need to reduce disclosure-related harms. In this study ...
Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
Standard cells are fundamental circuit building blocks designed at very early design stages. Nanometer standard cells are prone to lithography proximity and process variations. Ho...
Yongchan Ban, Savithri Sundareswaran, David Z. Pan
Abstract—In 3DICs heat dissipating devices are stacked directly on top of each other leading to a higher heat density than in a comparable 2D chip. 3D integration also moves the ...
Samson Melamed, Thorlindur Thorolfsson, Adi Sriniv...