16216 search results - page 2944 / 3244 » Effective Modeling with Constraints |
159
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DAC
2000
ACM
15 years 11 months ago
2000
ACM
—Chemical–mechanical polishing (CMP) is an enabling technique used in deep-submicrometer VLSI manufacturing to achieve long range oxide planarization. Post-CMP oxide topography...
180
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SC
2000
ACM
15 years 11 months ago
2000
ACM
This paper investigates the performance implications of data placement in OpenMP programs running on modern ccNUMA multiprocessors. Data locality and minimization of the rate of r...
188
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ICPR
2010
IEEE
15 years 11 months ago
2010
IEEE
This paper introduces a geometrically inspired large-margin classifier that can be a better alternative to the Support Vector Machines (SVMs) for the classification problems with ...
183
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CCS
2000
ACM
15 years 11 months ago
2000
ACM
Conventional firewalls rely on topology restrictions and controlled network entry points to enforce traffic filtering. Furthermore, a firewall cannot filter traffic it does ...
158
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DATE
2010
IEEE
15 years 11 months ago
2010
IEEE
Abstract--Leakage power consumption contributes significantly to the overall power dissipation for systems that are manufactured in advanced deep sub-micron technology. Different f...