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» Deviation Analysis: A New Use of Model Checking
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WSC
2007
15 years 9 months ago
An analysis of tool capabilities in the photolithography area of an ASIC fab
Photolithography is generally regarded as the most constraining element in semiconductor manufacturing. This is primarily attributable to the high capital investment and extensive...
P. J. Byrne, Cathal Heavey, Kamil Erkan Kabak
WOSP
2010
ACM
16 years 1 months ago
A general result for deriving product-form solutions in markovian models
In this paper we provide a general method to derive productform solutions for stochastic models. We take inspiration from the Reversed Compound Agent Theorem [14] and we provide a...
Andrea Marin, Maria Grazia Vigliotti
BMCBI
2007
113views more  BMCBI 2007»
15 years 6 months ago
Analysis and prediction of antibacterial peptides
Background: Antibacterial peptides are important components of the innate immune system, used by the host to protect itself from different types of pathogenic bacteria. Over the l...
Sneh Lata, B. K. Sharma, G. P. S. Raghava
ICCD
2006
IEEE
137views Hardware» more  ICCD 2006»
16 years 3 months ago
Reduction of Crosstalk Pessimism using Tendency Graph Approach
— Accurate estimation of worst-case crosstalk effects is critical for a realistic estimation of the worst-case behavior of deep sub-micron circuits. Crosstalk analysis models usu...
Murthy Palla, Klaus Koch, Jens Bargfrede, Manfred ...
IASSE
2004
15 years 8 months ago
Execution of A Requirement Model in Software Development
Latest research results have shown that requirements errors have a prolonged impact on software development and that they are more expensive to fix during later stages than early ...
Wuwei Shen, Mohsen Guizani, Zijiang Yang, Kevin J....