Approach Abstracts AltPSM Lithography Requirements for sub-100nm IC Design Domains Pradiptya Ghosh, Chung-shin Kang, Michael Sanie and David Pinto Numerical Technologies, 70 West P...
Pradiptya Ghosh, Chung-shin Kang, Michael Sanie, D...
: The transition from microelectronics to nanoelectronics reaches physical limits and results in a paradigm shift in the design and fabrication of electronic circuits. The conserva...
Technology scaling allows the integration of billions of transistors on the same die but CAD tools struggle in keeping up with the increasing design complexity. Design productivit...
Due to shrinking technology, increasing functional frequency and density, and reduced noise margins with supply voltage scaling, the sensitivity of designs to supply voltage noise...
Submission Deadline: December 14, 2009 The Journal of Visual Languages and Computing (http://www.elsevier.com/locate/jvlc, impact factor: 0.863) invites authors to submit papers fo...