4033 search results - page 201 / 807 » Design patterns in enterprise |
183
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ICCAD
2009
IEEE
15 years 4 months ago
2009
IEEE
Double patterning lithography (DPL) is a likely resolution enhancement technique for IC production in 32nm and below technology nodes. However, DPL gives rise to two independent, ...
162
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ICSM
2005
IEEE
16 years 3 days ago
2005
IEEE
Surprising as it may seem, many of the early adopters of the object-oriented paradigm already face a number of problems typically encountered in large-scale legacy systems. Softwa...
144
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ITS
2004
Springer
15 years 12 months ago
2004
Springer
Cognitive Tutors are proven effective learning environments, but are still not as effective as one-on-one human tutoring. We describe an environment (ALPS) designed to engage stude...
193
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DOCENG
2003
ACM
15 years 11 months ago
2003
ACM
XPath [3, 5] is a powerful and quite successful language able to perform complex node selection in trees through compact specifications. As such, it plays a growing role in many ...
147
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IPPS
1995
IEEE
15 years 10 months ago
1995
IEEE
High-performance parallel file systems are needed to satisfy tremendous I/O requirements of parallel scientific applications. The design of such high-performance parallel file ...