— Sub-resolution assist features (SRAFs) provide an absolutely essential technique for critical dimension (CD) control and process window enhancement in subwavelength lithography...
: In ultra-deep submicron VLSI circuits, clock network is a major source of power consumption and power supply noise. Therefore, it is very important to minimize clock network size...
As FPGAs enter the nanometer regime, several modifications are needed to reduce the increasing leakage power dissipation. Hence, this work presents some modifications to the FPG...
Designers are moving toward chip-multiprocessors (CMPs) to leverage application parallelism for higher performance while keeping design complexity under control. However, to date,...
Philo Juang, Qiang Wu, Li-Shiuan Peh, Margaret Mar...
Leakage power is one of the most critical issues for ultra-deep submicron technology. Subthreshold leakage depends exponentially on linewidth, and consequently variation in linewi...