This paper describes a new collaboration technology that is based on the support of lightweight, informally structured, opportunistic activities featuring heterogeneous threads of...
David R. Millen, Michael J. Muller, Werner Geyer, ...
Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
In this paper, we present a novel PDE based error concealment algorithm. We formulate the error concealment problem as a sequential optimization problem with both smoothing and or...
The design of Adaptive Hypermedia is a difficult task which can be made easier if generic systems and AH creators' models are reused. We address this design problem in the set...
The success of a company increasingly depends on timely information (internal or external) being available to the right person at the right time for crucial managerial decision-ma...
Andrew N. K. Chen, Paulo B. Goes, Alok Gupta, Jame...