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DAC
2006
ACM
16 years 7 months ago
Process variation aware OPC with variational lithography modeling
Optical proximity correction (OPC) is one of the most widely used resolution enhancement techniques (RET) in nanometer designs to improve subwavelength printability. Conventional ...
Peng Yu, Sean X. Shi, David Z. Pan
KDD
2004
ACM
160views Data Mining» more  KDD 2004»
16 years 7 months ago
k-TTP: a new privacy model for large-scale distributed environments
Secure multiparty computation allows parties to jointly compute a function of their private inputs without revealing anything but the output. Theoretical results [2] provide a gen...
Bobi Gilburd, Assaf Schuster, Ran Wolff
SAT
2007
Springer
181views Hardware» more  SAT 2007»
16 years 21 days ago
Breaking Symmetries in SAT Matrix Models
Abstract. Symmetry occurs naturally in many computational problems. The use of symmetry breaking techniques for solving search problems reduces the search space and therefore is ex...
Inês Lynce, João P. Marques Silva
ICPR
2010
IEEE
15 years 9 months ago
Near-Regular BTF Texture Model
—In this paper we present a method for seamless enlargement and editing of intricate near-regular type of bidirectional texture function (BTF) which contains simultaneously both ...
Michael Haindl, Martin Hatka
ACL
2009
15 years 4 months ago
Stochastic Gradient Descent Training for L1-regularized Log-linear Models with Cumulative Penalty
Stochastic gradient descent (SGD) uses approximate gradients estimated from subsets of the training data and updates the parameters in an online fashion. This learning framework i...
Yoshimasa Tsuruoka, Jun-ichi Tsujii, Sophia Anania...