Abstract--To reduce chip-scale topography variation in Chemical Mechanical Polishing (CMP) process, dummy fill is widely used to improve the layout density uniformity. Previous res...
Chunyang Feng, Hai Zhou, Changhao Yan, Jun Tao, Xu...
With the increasing clock rate and transistor count of today's microprocessors, power dissipation is becoming a critical component of system design complexity. Thermal and po...
A fundamental requirement for autonomic computing is to be able to automatically infer how human users react in similar contextual conditions. This paper examines the problem of a...
Nearchos Paspallis, Konstantinos Kakousis, George ...
Generating interest in specialized areas of Computer Science (CS) is one of the goals of the department of Computer and Information Science at Spelman College as with most departm...
The growing popularity of aspect-oriented languages, such as AspectJ, and of corresponding design approaches, makes it important to learn how best to modularize programs in which ...
Kevin J. Sullivan, William G. Griswold, Yuanyuan S...