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TCAD
2010
194views more  TCAD 2010»
15 years 2 months ago
Layout Decomposition Approaches for Double Patterning Lithography
Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different ex...
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...
CVPR
2000
IEEE
16 years 9 months ago
Learning from One Example through Shared Densities on Transforms
We define a process called congealing in which elements of a dataset (images) are brought into correspondence with each other jointly, producing a data-defined model. It is based ...
Erik G. Miller, Nicholas E. Matsakis, Paul A. Viol...
ICPR
2006
IEEE
16 years 8 months ago
Adaptive Discriminant Projection for Content-based Image Retrieval
Content-based Image Retrieval (CBIR) is a computer vision application that aims at automatically retrieving images based on their visual content. Linear Discriminat Analysis and i...
Jie Yu, Qi Tian
RECOMB
2001
Springer
16 years 7 months ago
Context-specific Bayesian clustering for gene expression data
The recent growth in genomic data and measurements of genome-wide expression patterns allows us to apply computational tools to examine gene regulation by transcription factors. I...
Yoseph Barash, Nir Friedman
EDBT
2004
ACM
94views Database» more  EDBT 2004»
16 years 7 months ago
Mining Extremely Skewed Trading Anomalies
Trading surveillance systems screen and detect anomalous trades of equity, bonds, mortgage certificates among others. This is to satisfy federal trading regulations as well as to p...
Wei Fan, Philip S. Yu, Haixun Wang