A GIS provides a powerful collection of tools for the management, visualization and analysis of spatial data. These tools can be even more powerful when they are integrated with s...
Konstantin Krivoruchko, Carol A. Gotway, Alex Zhig...
In double patterning lithography (DPL), coloring conflict and stitch minimization are the two main challenges. Post layout decomposition algorithm [1] [2]may not be enough to achi...
The threshold voltage (Vth) of a nanoscale transistor is severely affected by random dopant fluctuations and line-edge roughness. The analysis of these effects usually requires at...
This paper argues for an implicitly parallel programming model for many-core microprocessors, and provides initial technical approaches towards this goal. In an implicitly paralle...
Wen-mei W. Hwu, Shane Ryoo, Sain-Zee Ueng, John H....
The ability to account for the growing impacts of multiple process variations in modern technologies is becoming an integral part of nanometer VLSI design. Under the context of ti...