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DAC
2006
ACM
16 years 7 months ago
Process variation aware OPC with variational lithography modeling
Optical proximity correction (OPC) is one of the most widely used resolution enhancement techniques (RET) in nanometer designs to improve subwavelength printability. Conventional ...
Peng Yu, Sean X. Shi, David Z. Pan
DAC
2006
ACM
16 years 7 months ago
Placement of digital microfluidic biochips using the t-tree formulation
Droplet-based microfluidic biochips have recently gained much attention and are expected to revolutionize the biological laboratory procedure. As biochips are adopted for the comp...
Ping-Hung Yuh, Chia-Lin Yang, Yao-Wen Chang
ICML
2008
IEEE
16 years 7 months ago
On the quantitative analysis of deep belief networks
Deep Belief Networks (DBN's) are generative models that contain many layers of hidden variables. Efficient greedy algorithms for learning and approximate inference have allow...
Ruslan Salakhutdinov, Iain Murray
ICML
2003
IEEE
16 years 7 months ago
Hidden Markov Support Vector Machines
This paper presents a novel discriminative learning technique for label sequences based on a combination of the two most successful learning algorithms, Support Vector Machines an...
Yasemin Altun, Ioannis Tsochantaridis, Thomas Hofm...
SIGSOFT
2003
ACM
16 years 7 months ago
Bogor: an extensible and highly-modular software model checking framework
Model checking is emerging as a popular technology for reasoning about behavioral properties of a wide variety of software artifacts including: requirements models, architectural ...
Robby, Matthew B. Dwyer, John Hatcliff