Recent successes in the development and self-assembly of nanoelectronic devices suggest that the ability to manufacture dense nanofabrics is on the near horizon. However, the trem...
Margarida F. Jacome, Chen He, Gustavo de Veciana, ...
In the design of highly complex, heterogeneous, and concurrent systems, deadlock detection and resolution remains an important issue. In this paper, we systematically analyze the ...
Xi Chen, Abhijit Davare, Harry Hsieh, Alberto L. S...
Physical phenomena such as temperature have an increasingly important role in performance and reliability of modern process technologies. This trend will only strengthen with futu...
Rajarshi Mukherjee, Seda Ogrenci Memik, Gokhan Mem...
As the process technology enters the nanometer era, reliability has become a major concern in the design and manufacturing of VLSI circuits. In this paper we focus on one reliabil...
Antenna effect may damage gate oxides during plasma-based fabrication process. The antenna ratio of total exposed antenna area to total gate oxide area is directly related to the ...