4539 search results - page 503 / 908 » Approaches to Compute Workflow Complexity |
173
Voted
ICCD
2005
IEEE
16 years 3 months ago
2005
IEEE
The advent of nanometer feature sizes in silicon fabrication has triggered a number of new design challenges for computer designers. These challenges include design complexity and...
181
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ICCAD
2007
IEEE
16 years 3 months ago
2007
IEEE
—As the 193nm lithography is likely to be used for 45nm and even 32nm processes, much more stringent requirement will be posed on Optical Proximity Correction (OPC) technologies....
214
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SOSP
2007
ACM
16 years 3 months ago
2007
ACM
We propose a new paradigm for building scalable distributed systems. Our approach does not require dealing with message-passing protocols—a major complication in existing distri...
170
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CEC
2008
IEEE
16 years 1 months ago
2008
IEEE
— Many complex, real world phenomena are difficult to study directly using controlled experiments. Instead, the use of computer simulations has become commonplace as a cost effe...
172
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ICC
2008
IEEE
16 years 1 months ago
2008
IEEE
—In this paper, we discuss how to prevent users’ passwords from being stolen by adversaries. We propose differentiated security mechanisms in which a user has the freedom to ch...