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» An Integrated Rule Modeling Framework
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DAC
2006
ACM
16 years 7 months ago
Process variation aware OPC with variational lithography modeling
Optical proximity correction (OPC) is one of the most widely used resolution enhancement techniques (RET) in nanometer designs to improve subwavelength printability. Conventional ...
Peng Yu, Sean X. Shi, David Z. Pan
ICDM
2009
IEEE
148views Data Mining» more  ICDM 2009»
16 years 1 months ago
Hierarchical Bayesian Models for Collaborative Tagging Systems
—Collaborative tagging systems with user generated content have become a fundamental element of websites such as Delicious, Flickr or CiteULike. By sharing common knowledge, mass...
Markus Bundschus, Shipeng Yu, Volker Tresp, Achim ...
ICMCS
2007
IEEE
130views Multimedia» more  ICMCS 2007»
16 years 24 days ago
Word Topical Mixture Models for Extractive Spoken Document Summarization
This paper considers extractive summarization of Chinese spoken documents. In contrast to conventional approaches, we attempt to deal with the extractive summarization problem und...
Berlin Chen, Yi-Ting Chen
EUC
2005
Springer
16 years 9 hour ago
On Tools for Modeling High-Performance Embedded Systems
Abstract. Most of the new embedded systems require high performance processors at low power. To cater to these needs, most semiconductor companies are designing multi-core processo...
Anilkumar Nambiar, Vipin Chaudhary
IPPS
1998
IEEE
15 years 10 months ago
Airshed Pollution Modeling: A Case Study in Application Development in an HPF Environment
In this paper, we describe our experience with developing Airshed, a large pollution modeling application, in the Fx programming environment. We demonstrate that high level parall...
Jaspal Subhlok, Peter Steenkiste, James M. Stichno...