21430 search results - page 3622 / 4286 » Abstract Effective Models |
218
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VTS
2000
IEEE
15 years 11 months ago
2000
IEEE
The performance of deep sub-micron designs can be affected by various parametric variations, manufacturing defects, noise or even modeling errors that are all statistical in natur...
180
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DAC
2000
ACM
15 years 11 months ago
2000
ACM
—Chemical–mechanical polishing (CMP) is an enabling technique used in deep-submicrometer VLSI manufacturing to achieve long range oxide planarization. Post-CMP oxide topography...
195
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SC
2000
ACM
15 years 11 months ago
2000
ACM
This paper investigates the performance implications of data placement in OpenMP programs running on modern ccNUMA multiprocessors. Data locality and minimization of the rate of r...
201
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ICPR
2010
IEEE
15 years 11 months ago
2010
IEEE
This paper introduces a geometrically inspired large-margin classifier that can be a better alternative to the Support Vector Machines (SVMs) for the classification problems with ...
202
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CCS
2000
ACM
15 years 11 months ago
2000
ACM
Conventional firewalls rely on topology restrictions and controlled network entry points to enforce traffic filtering. Furthermore, a firewall cannot filter traffic it does ...