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A low-leakage current power 180-nm CMOS SRAM
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Dual-K Versus Dual-T Technique for Gate Leakage Reduction : A Comparative Perspective
16 years 1 days ago
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As a result of aggressive technology scaling, gate leakage (gate oxide direct tunneling) has become a major component of total power dissipation. Use of dielectrics of higher perm...
Saraju P. Mohanty, Ramakrishna Velagapudi, Elias K...
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