11963 search results - page 2073 / 2393 » A framework for linguistic modelling |
201
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ISPD
2010
ACM
16 years 1 months ago
2010
ACM
Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
163
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SAC
2010
ACM
16 years 1 months ago
2010
ACM
KAOS is a goal directed requirements engineering framework based on the decomposition and refinement of goals. Decomposition and refinement continue until a point is reached at ...
161
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EDBTW
2010
Springer
16 years 1 months ago
2010
Springer
To face the increasing demand from users, National Statistical Institutes (NSI) release different information products. The dissemination of this information should be performed ...
185
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CVPR
2009
IEEE
16 years 1 months ago
2009
IEEE
While video-based activity analysis and recognition has received much attention, existing body of work mostly deals with single object/person case. Coordinated multi-object activi...
175
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HICSS
2009
IEEE
16 years 1 months ago
2009
IEEE
Successful knowledge management results in a competitive advantage in today’s information- and knowledge-rich industries. The elaboration and integration of emerging web-based t...